Home >> Fine- Structure Analysis Section (B01)
Fine- Structure Analysis Section (B01)
◇analysis device
FT-TEM/STEM, LOW-TEM, FE-SEM/EBSP
XRD, AFM/SPM, GD-OES
◇Processing equipment for electron microscopes
Ion milling system（Thin film/cross section）, Cross section polisher
Grinding/Polishing machine, Precision cutting machine
◇Coater
Carbon coater, Metal coater
◇others
Plasma etching, Hydrophilic treatment apparatus, Ion cleaner
Vacuum impregnation system, Dimple grinder, Microtome
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Achievements(Journals/Papers)
Achievements(Journals/Papers)
| Model |
Hitachi HF-2000 |
| Accelerate Voltage |
200 kV |
| Resolution |
0.20 nm |
| Electron gun |
Cold-FEG |
| Probe mode |
TEM |
| Applications |
TEM image (Bright Field, Dark Field, High-resolution), Electron Diffraction (SAED, NBD), EDX elemental analysis (point/line/scan, quantitative) |
Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
Operation manual |
HF-2000 operation manual |
| Model |
JEOL JEM-2100F |
| Accelerate Voltage |
200 kV |
| Resolusion |
Spatial resolution: 0.19 nm, Point resolution: 0.1 nm |
| Electron gun |
Schottky-type FE electron gun |
| Probe mode |
TEM, STEM |
| Accessories |
EDX
Detectable element: B - U
Energy resolution: 133 eV
STEM
Bottom-mounted CCD camera
Sample holder
Beryllium 2 axis inclination
|
| Applications |
TEM image (Bright Field, Dark Field, High-resolution), Electron Diffraction (SAED, NBD), EDX elemental analysis (point/line/scan, quantitative) |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
Hitachi HT-7500 |
| Accelerate Voltage |
100 kV |
| Resolution |
Spatial resolution: 0.36 nm, Point resolution: 0.20 nm |
| Electron gun |
LaB6, W |
| Probe mode |
TEM |
| Accessories |
Bottom-mounted CCD camera |
| Applications |
TEM image (Bright Field, Dark Field), Electron Diffraction (SAED) |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
HT-7500 operation manual |
| Model |
JEOL IT-800(HL) |
| Accelerate Voltage |
1-30 kV(Operation is fixed at 15kV) |
| Resolution |
0.7 nm(20kV) |
| Electron gun |
Schottky-type electron gun（Thermal） |
| Observation mode |
Secondary electrons, reflected/backscattered electrons |
| Accessories |
SED
UED
EDX
Backscattered electrons detector
EBSD |
| Applications |
Morphological observation of ceramics and metals, elemental analysis (point, mapping, qualitative, quantitative) |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
JEOL JSM-7100F |
| Accelerate Voltage |
1-30 kV(Operation is fixed at 15kV) |
| Resolution |
1.2nm (@30kV), 3.0nm (@1kV) |
| Electron gun |
Schottky-type electron gun（Thermal） |
| Observation mode |
Secondary electrons, reflected/backscattered electrons |
| Accessories |
EDX-SDD
Backscattered electrons detector
EBSD |
| Applications |
Morphological observation of ceramics and metals, elemental analysis (point, mapping, qualitative, quantitative). |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
Rigaku MiniFlex600/600-C |
| Radiation source |
CuKα |
| Goniometer |
Radius 150mm |
| Administrator |
Miyazaki |
| Notes |
Under adjustment |
| Model |
SII Nanocute |
| Measurement modes |
AFM, DFM, Current (Nano, Pico) |
| Detection methods |
self-detecting / optical cantilever |
| Resolution |
X, Y：Within 10 nm, Z：Within 0.5 nm |
| Applications |
Morphological observation in local region of sample surface. |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
AFM-DFM operation manual |
| Model |
HORIBA JOBIN YVON, GD-Profiler 2 |
| Optical emission |
High Frequency Output: 0 - 300 W, pulse control: 1 - 100 Hz, gas pressure: 0 - 1000 Pa |
| Detector |
Photomultiplier tube |
| Spectrometer |
Polychrometer , monochromator |
| Anode diameter |
⌀4mm (standard) |
| Target elements |
H - |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
GATAN PIPS Model 691 |
| Ionization energy |
0.5-6.0 keV |
| Beam irradiation angle |
0.5-10° |
| Beam diameter |
ca. 350µm at 5keV |
| Gas |
Ar |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
PIPS691 operation manual |
| Model |
JEOL IB-19530CP |
| Ionization Voltage |
2-8kV |
| Processing Mode |
Sample Rotation Mode
Intermittent Machining Mode
Finishing mode
Wide area cross-sectional milling mode |
| gas |
Ar |
| Purpose |
Surface and cross-section finishing of samples for SEM observation |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
CP operation manual |
| Model |
LaboPol-5 |
| Rotational speed |
50 - 500 rpm |
| Abrasive paper |
#240 - #8,000 |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
Metaserv 250(BUEHLER) |
| Rotational speed |
Max. 500 rpm |
| Abrasive paper |
⌀200 |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
ML-150P |
| Rotation speed |
30 - 150 rpm |
| Abrasive |
Colloidal silica, diamond slurry |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
Minitom (Marumoto struers) |
| Rotation speed |
100 - 420 rpm |
| Cut wheel diameter |
100 - 127 mm |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
CC-40F |
| Coating method |
Thermal vapor deposition |
| Target |
Carbon |
| Film thickness |
nm - sub µm (adjustable by pressure or stage position) |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
Carbon Coater operation manual |
| Model |
JFC-1500 |
| Coating method |
Sputtering |
| Target |
Au, Pt |
| Coating film thickness |
nm - sub µm (adjustable by sputtering pressure) |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
Metal Coater operation manual |
| Model |
SEDE-MN |
| Gas |
Nitrogen, oxygen |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Operation manual |
SEDE-MN Operation manual |
| Model |
JIC-410 (JEOL) |
| Discharge method |
Horizontal electrode type |
| Target |
Carbon |
| Vacuum chamber |
O.D. 118mm x height 37mm |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
Cast N |
| Pressure during use |
7×104 Pa |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations
|
| Model |
Gatan Model 656 |
| Rotation speed |
10 rpm |
| Grinding Wheel Speed |
0 - 600 rpm |
| Load |
0 - 40g |
| Final sample thickness |
10µm |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
Leica VT1000 S |
| Specification |
Vibrating microtome |
| Sample size |
MAX 70x40x15mm |
| Sample vertical stroke |
MAX 15mm |
| Sectioning range |
MAX 40mm |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |
| Model |
MEIHAN MUS-4SA |
| Number of revolutions |
400 - 3000 rpm |
| Cutting wheel diameter |
100mm |
| Sample vertical stroke |
MAX 15mm |
| Administrator |
Miyazaki |
| Notes |
Please contact administrator for sample preparations and operations |