Home >> Fine structure analysis (B01)
Instruments of Fine structure analysis (B01)
FE-TEM
| Model | Hitachi HF-2000 |
|---|---|
| Accelerating voltage | 200 kV |
| Resolution | 0.20 nm |
| Electron gun | Cold-FEG |
| Probe mode | TEM |
| Applications | Structural analysis (bright field image, dark field image, high resolution image, electron diffraction), elemental analysis (point, qualitative, quantitative) in the local region | Person in charge | Miyazaki |
| Notes | The specimen must be fixed to the observation grid (⌀3 mm) or it must be flaked. For sample preparation, please contact the person in charge. | Operation manual | HF-2000 operation manual |
FE-TEM/STEM
| Model | JEOL JEM-2100F |
|---|---|
| Accelerating voltage | 200 kV |
| Reaolusion | Particle image: 0.19 nm, Lattice image: 0.1 nm |
| Electron gun | Schottky-type FE electron gun |
| Probe mode | TEM, STEM |
| Accessory device | EDX Detectable element: B - U
Energy resolution: 133 eV
STEMBottom-mounted CCD camera Sample holder Beryllium 2 axis inclination
|
| Applications | Structural analysis (bright field image, dark field image, high resolution image, electron diffraction), elemental analysis (point, mapping, qualitative, quantitative) in the local region. |
| Person in charge | Miyazaki |
| Notes | The specimen must be fixed to the observation grid (⌀3 mm) or it must be flaked. For sample preparation, please contact the person in charge. |
LOW-TEM
| Model | Hitachi HT-7500 |
|---|---|
| Accelerating voltage | 100 kV |
| Resolution | Particle image: 0.36 nm, Lattice image: 0.20 nm |
| Electron gun | LaB6, W |
| Probe mode | TEM |
| Accessory device | Bottom-mounted CCD camera |
| Applications | Structure analysis in local region (bright field image, dark field image, electron diffraction). |
| Person in charge | Miyazaki |
| Notes | The specimen must be fixed to the observation grid (⌀3 mm) or it must be flaked. For sample preparation, please contact the person in charge. |
| Operation manual | HT-7500 operation manual |
FE-SEM
| Model | JEOL IT-800(HL) |
|---|---|
| Accelerating voltage | 1-30 kV |
| Resolution | 0.7 nm(20kV) |
| Electron gun | Schottky-type electron gun（Thermal） |
| Observation mode | Secondary electrons, reflected electrons, irregularities image. |
| Accessory device | SED UED EDX Backscattered electrons detector EBSD |
| Applications | Morphological observation of ceramics and metals, elemental analysis (point, mapping, qualitative, quantitative) |
| Person in charge | Miyazaki |
| Notes | In principle, the user operates it. When using for the first time, please be sure to receive an operation course from the person in charge. The course time is about 1.5 hours from basic operation to analysis and analysis. It is necessary that the sample is completely dry and the sample surface is in a conducting state. In case of uncertainty please contact the person in charge. |
FE-SEM/EBSP
| Model | JEOL JSM-7100F |
|---|---|
| Accelerating voltage | 1-30 kV |
| Resolution | 1.2nm (@30kV), 3.0nm (@1kV) |
| Electron gun | Schottky-type electron gun（Thermal） |
| Observation mode | Secondary electrons, backscattered electrons, crystal orientation map (IPF, IQ, G.B. map) |
| Accessory device | EDX-SDD Backscattered electrons detector Crystal orientation analyzer (EBSD) |
| Applications | Morphological observation of ceramics and metals, elemental analysis (point, mapping, qualitative, quantitative). |
| Person in charge | Miyazaki |
| Notes | In principle, the user operates it. When using for the first time, please be sure to receive an operation course from the person in charge. The course time is about 1.5 hours from basic operation to analysis and analysis. It is necessary that the sample is completely dry and the sample surface is in a conducting state. In case of uncertainty please contact the person in charge. |
XRD
| Model | Rigaku MiniFlex600/600-C |
|---|---|
| Radiation source | CuKα 600W x-ray tube |
| Detector | one dimensional detector |
| Goniometer | Radius 150mm |
| Applications | Crystal structure measurement using X-ray diffraction. |
| Person in charge | Miyazaki |
| Notes | Please contact the person in charge regarding use. |
| Remarks | Currently being adjusted. |
AFM/SPM
| Model | SII Nanocute |
|---|---|
| Measurement modes | AFM, DFM, Current (Nano, Pico) |
| Detection methods | Self-detecting method, optical lever method |
| Resolution | X, Y：Within 10 nm, Z：Within 0.5 nm |
| Applications | Morphological observation in local region of sample surface. |
| Person in charge | Miyazaki |
| Notes | In principle, the user operates oneself. When using for the first time, please be sure to receive an operation course from the person in charge. The lesson time is about two hours. Size and shape of sample are limited. Please contact the person in charge. surface roughness parameter |
| Operation manual | AFM-DFM operation manual |
GD-OES (Glow Discharge Optical Emission Spectrometer)
| Model | HORIBA JOBIN YVON, GD-Profiler 2 |
|---|---|
| Optical emission | High Frequency Output: 0 - 300 W, pulse control: 1 - 100 Hz, gas pressure: 0 - 1000 Pa |
| Detector | Photomultiplier tube |
| Spectrometer | Polychrometer , monochromator |
| Anode diameter | ⌀4mm (standard) |
| Target elements | H - |
| Applications | A sample is sputter-etched by a high-frequency pulsed glow discharge, and the sputter particles emitted from the sample are excited and emit light in the glow discharge, which is then spectrally analyzed for qualitative and quantitative analysis of elements in the depth direction. |
| Person in charge | Miyazaki |
| Notes | Please contact the person in charge when using the equipment. The entire sample should be conductive and the surface to be analyzed should be smooth and flat. |
Ion milling machine
| Model | GATAN PIPS Model 691 |
|---|---|
| Ionization energy | 0.5-6.0 keV |
| Beam irradiation angle | 0.5-10° |
| Beam diameter | ca. 350µm at 5keV |
| Gas | Ar |
| Applications | Thinning of sample for transmission electron microscope (TEM), final finish of polished surface. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. It must be fixed to the TEM mesh with a sample thickness of 50 µm or less. In case of uncertainty please contact the person in charge. |
| Operation manual | PIPS691 operation manual |
Polishing machine (Handy lap)
| Model | LaboPol-5 |
|---|---|
| Rotational speed | 50 - 500 rpm |
| Abrasive paper | #240 - #8,000 |
| Applications | Thinning of specimen for microscopic observation or facing out. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
Precision rotating polishing machine
| Model | M-Prep5（ALLIED） |
|---|---|
| Rotational speed | Max. 500 rpm |
| Abrasive paper | ⌀200 |
| Applications | Thinning of specimen for microscopic observation or facing out. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
Polishing machine
| Model | ML-150P |
|---|---|
| Rotation speed | 30 - 150 rpm |
| Abrasive | Colloidal silica, diamond slurry |
| Applications | Mirror surface polishing of sample for microscopic observation |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
Cutting machine
| Model | Minitom (Marumoto struers) |
|---|---|
| Rotation speed | 100 - 420 rpm |
| Cut wheel diameter | 100 - 127 mm |
| Applications | Cutting of samples for material microstructure inspection, ceramics samples etc. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
Carbon coater
| Model | CC-40F |
|---|---|
| Coating method | Thermal vapor deposition |
| Target | Carbon |
| Film thickness | nm - sub µm (adjustable by pressure or stage position) |
| Applications | Antistatic prevention mainly for electron microscopic observation. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
| Operation manual | Carbon Coater operation manual |
Metal coater
| Model | JFC-1500 |
|---|---|
| Coating method | Sputtering |
| Target | Au, Pt |
| Coating film thickness | nm - sub µm (adjustable by sputtering pressure) |
| Applications | Antistatic prevention mainly for electron microscopic observation. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
| Operation manual | Metal Coater operation manual |
Plasma etching hydrophilic treatment apparatus
| Model | SEDE-MN |
|---|---|
| Gas | Nitrogen, oxygen |
| Applications | Removal of contamination on sample surface, hydrophilization treatment of carbon mesh, etc. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. |
| Operation manual | SEDE-MN Operation manual |
Ion cleaner
| Model | JIC-410 (JEOL) |
|---|---|
| Discharge method | Horizontal electrode type |
| Target | Carbon |
| Vacuum chamber | O.D. 118mm x height 37mm |
| Applications | Removal of hydrocarbon contaminants adhering to the sample using glow discharge. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge.
Size and shape of sample are limited. Please contact the person in charge. |
Vacuum impregnation system
| Model | Cast N |
|---|---|
| Pressure during use | 7×104 Pa |
| Applications | Resin filling and fixing of sample |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge.
Size and shape of sample are limited. Please contact the person in charge. |
Dimple grinder
| Model | Gatan Model 656 |
|---|---|
| Rotation speed | 10 rpm |
| Grinding Wheel Speed | 0 - 600 rpm |
| Load | 0 - 40g |
| Final sample thickness | 10µm |
| Applications | The sample thinning treatment mainly for electron microscopic observation. |
| Person in charge | Miyazaki |
| Notes | When using for the first time, please be sure to receive an operation course from the person in charge. Consumables such as abrasives are also available here, but as there are limited quantities, we may bring you depending on the usage situation. Please contact the person in charge for details. |
Microtome
| Model | Leica VT1000 S |
|---|---|
| Specification | Vibrating microtome |
| Sample size | MAX 70x40x15mm |
| Sample vertical stroke | MAX 15mm |
| Sectioning range | MAX 40mm |
| Applications | Thin section cutting of samples for microscopic observation. |
| Person in charge | Miyazaki |
| Notes | Please contact the person in charge regarding use. |
Tabletop cutting machine
| Model | MEIHAN MUS-4SA |
|---|---|
| Number of revolutions | 400 - 3000 rpm |
| Cutting wheel diameter | 100mm |
| Sample vertical stroke | MAX 15mm |
| Applications | Cutting samples for material microstructure inspection, ceramic samples, etc. |
| Person in charge | Miyazaki |
| Notes | If you are using it for the first time, please be sure to take a training course from the person in charge. |